Speaker
Description
The lecture provides an overview of key nanofabrication processes used in the production of nanoscale devices which are available in CEITEC nano research infrastructure. It focuses on lithography techniques, both laser and electron and their roles in patterning at the nanoscale. The lithography is usually followed by etching processes, including dry (plasma) etching and wet chemical etching, which enable precise material removal and feature definition. Additional processes are thin-film deposition methods such as Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD), and their applications in fabricating high-quality, uniform layers crucial for device performance. The integration of these processes facilitates the advancement of nanoscale device fabrication, contributing to developments in electronics, photonics, and sensor technologies.
