Speaker
Josef Polčák
(CEITEC - Central European Institute of Technology, Brno University of Technology, Purkyňova 123, Brno 612 00, Czech Republic)
Description
X-ray Photoelectron Spectroscopy is frequently used method for elemental and chemical analysis of surfaces and ultra thin films. By using proper model, the method is also able to obtain information about morphology, for example thickness of ultra thin films. Information depth is dependent on energy of incident X-ray radiation, therefore it is twice higher in case of using Ag Lα (2984.3 eV) than standard Al Kα (1486.6 eV). In presented work, we studied possibilities of using Ag Lα X-ray radiation for determination of Al2O3 layer thickness. The layers were deposited on silicon substrate by Atomic Layer Deposition and analysed by Kratos Axis Supra spectrometer in CzechNanoLab research infrastructure.
Primary author
Josef Polčák
(CEITEC - Central European Institute of Technology, Brno University of Technology, Purkyňova 123, Brno 612 00, Czech Republic)
Co-authors
Mr
David Pokorný
(CEITEC Brno University of Technology, Purkyňova 123, 612 00 Brno, Czech Republic)
Dr
Jan Čechal
(CEITEC Brno University of Technology, Purkyňova 123, 612 00 Brno, Czech Republic)
Prof.
Tomáš Šikola
(CEITEC Brno University of Technology, Purkyňova 123, 612 00 Brno, Czech Republic)
